The PlasmaPro 800 with a 460mm diameter table offers full 300mm or large batch 43 x 50mm (2”) capacity, enabling full production solutions and establishing the PlasmaPro 800 as a well proven market leading product.
Allowing maximum process flexibility for compound semiconductor, optoelectronics, and photonics applications, the PlasmaPro 800 provides:
Large electrode- Low Cost of Ownership
Etch end point detection- Reliability and serviceability
Endpoint detection by laser interferometry and/or optical emission spectroscopy- Can be fitted to enhance etch control
Options of a 4-, 8- or 12-line gas pod——提供了灵活的流程和过程ses, and may be remotely sited in the service area, away from the main process tool
Close-coupled turbo pump——压力高抽速和优秀的基地
Datalogging- Traceability and history of chamber and process conditions
Fluid-cooled and/or electrically-heated electrodes- Excellent electrode temperature control and stability