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等离子体技术
Part of the Oxford Instruments Group
The PlasmaPro 100 RIE modules deliver anisotropic dry etching for an extensive range of processes.
Excellent uniformity, high throughput and high precision processes
Wide temperature range electrode, -150°C to 400°C
RIE of InP waveguide
70nm Fused Silica lines 933nm deep Cr mask - Courtesy of Cornell Nanoscience facility
介质蚀刻- Courtesy of Atmel
狗万正网地址牛津工具致力于提供全面，灵活可靠的全球客户支持。我们在整个系统中提供优质的服务。
PTIQ is the latest intelligent software solution for PlasmaPro and Ionfab processing equipment.
煤气套装- 掺入额外的气体管线并允许更大的灵活性
Logviewer software- datalogging software allows realtime graphing and post run analysis
光端点检测器——实现最优的一个重要工具process results
Soft pump- allows the slow pumping down of a vacuum chamber
涡轮分子真空泵- offers superior pumping speeds and higher throughput
X20 Control System- 提供未来的证明，灵活可靠的工具，系统的“智力”增加
先进的能量求发电机- 提供更高的可靠性和更高的等离子体稳定性
自动控制- This controller ensures very fast and accurate pressure control
双cm仪表切换- provides the ability to utilise two differing ranges of capacitance manometer via a single pressure control valve
LN2 autochangeover unit- 使台式冷却流体自动切换在液氮（LN2）和冷却器流体之间
TEOS liquid level sensing- 使用安装在Teos罐的超声电平传感器实现了电平传感
Wide temperature range electrode- 显着的设计改进，以提高流程性能
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