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  1. Home
  2. Processes
  3. Nickel

Nickel

狗万正网地址牛津仪器等离子体技术是领先的supplier of innovative plasma processing solutions for Nickel, unlocking the maximum performance from your devices.

Nickel(Ni) is highly corrosion resistant and is used for electrical contacts in semiconductor devices. It can also be used as a hard mask forplasma etching. It may be deposited usingIon Beam Deposition (IBD)and it can be etched usingInductively Coupled Plasma (ICP),Reactive Ion Etching (RIE)orIon Beam Etch (IBE). It etches cleanly and anisotropically with Oxford Instrument's optimised plasma solutions.

Nickel

Competitive etching rate with good control of redeposition.

More on ICP Request more information
Nickel ICP Etching

Competitive etching rate with good control of redeposition.

More on RIE Request more information
Nickel RIE Etching

Process expertise applied to control redeposition and produce good profile at competitive etching rate.

More on IBE Request more information
Nickel IBE

Competitive process results.

More on IBD Request more information

Related Products

PlasmaPro 100 Cobra ICP RIE Etch
1000 Series Glass X-ray Tube
PlasmaPro 100 RIE

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